A Photocurable Leaky Dielectric for Highly Electrical Insulating Electrohydrodynamic Micro-/Nanopatterns

Guolong Wang,Guowei Lv,Shihu Zhang,Jinyou Shao,Xiangming Li,Hongmiao Tian,Demei Yu,Lifeng Zhang
DOI: https://doi.org/10.1039/c6sm01151a
IF: 4.046
2016-01-01
Soft Matter
Abstract:This communication describes an innovative photocurable leaky dielectric for electrohydrodynamic patterning (EHDP). Based on the well-designed molecular structure, the material in its liquid state exhibits low viscosity, high homogeneity, and more importantly a leaky dielectric characteristic; meanwhile, UV light irradiation transforms it from a liquid leaky dielectric into a solid perfect dielectric instantaneously via an interfacial reaction. Two typical EHDP processes have confirmed that the beneficial properties of this material help to rapidly fulfill a higher aspect ratio and/or smaller feature size patterning compared to its perfect dielectric counterpart. Therefore, this material provides the potential in accessing high-performance EHDP towards fabricating electrically insulating micro-/nanostructures.
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