Preparation, Properties, and Efficient Electrically Induced Structure Formation of A Leaky Dielectric Photoresist

Guowei Lv,Shihu Zhang,Jinyou Shao,Hongmiao Tian,Guolong Wang,Demei Yu

DOI: https://doi.org/10.1039/c6ra17957f

IF: 4.036

2016-01-01

RSC Advances

Abstract:Electrohydrodynamic structures with hydrophobic surfaces were fabricated instantaneously at ambient temperature using a designed leaky dielectric photoresist film.

What problem does this paper attempt to address?

Rapid Fabrication of Electrohydrodynamic Micro-/Nanostructures with High Aspect Ratio Using a Leaky Dielectric Photoresist

Guowei Lv,Shihu Zhang,Jinyou Shao,Guolong Wang,Hongmiao Tian,Demei Yu

DOI: https://doi.org/10.1016/j.reactfunctpolym.2017.06.014

2017-01-01

Abstract:A leaky dielectric photoresist was designed and prepared for rapid fabrication of high-aspect-ratio micro-/nanostructures via electrohydrodynamic patterning (EHDP). The rheological behavior and electrical properties of the photoresists were systematically investigated, since the structure formation in EHDP essentially originates from the flow and deformation of the polymeric film actuated by an applied electric field. It is found that the photoresists exhibit the suitable rheological behavior with a low viscosity of 2.4–157.7mPas, controllable electrical conductivity of 5.0×10−6−7.2×10−4Sm−1, as well as high homogeneity, minor surface tension of about 30 mN·m−1, favorable wettability and film-forming property on substrate and an extremely large reduction in the contact angle (down to 1.64°) of electrowetting on dielectric (EWOD). The EHDP results have shown that a higher electrical conductivity of the photoresists can lead to a higher filling height, a smaller characteristic wavelength and a shorter patterning time, while a lower viscosity can also lead to a shorter patterning time, which is accordance with the theoretical prediction. In addition, the patterning time of the photoresists cannot be too short because the following rapid ripening and coalescence of the formed microstructure will damage the high fidelity of the final pillar arrays.
A Photocurable Leaky Dielectric for Highly Electrical Insulating Electrohydrodynamic Micro-/Nanopatterns

Guolong Wang,Guowei Lv,Shihu Zhang,Jinyou Shao,Xiangming Li,Hongmiao Tian,Demei Yu,Lifeng Zhang

DOI: https://doi.org/10.1039/c6sm01151a

IF: 4.046

2016-01-01

Soft Matter

Abstract:This communication describes an innovative photocurable leaky dielectric for electrohydrodynamic patterning (EHDP). Based on the well-designed molecular structure, the material in its liquid state exhibits low viscosity, high homogeneity, and more importantly a leaky dielectric characteristic; meanwhile, UV light irradiation transforms it from a liquid leaky dielectric into a solid perfect dielectric instantaneously via an interfacial reaction. Two typical EHDP processes have confirmed that the beneficial properties of this material help to rapidly fulfill a higher aspect ratio and/or smaller feature size patterning compared to its perfect dielectric counterpart. Therefore, this material provides the potential in accessing high-performance EHDP towards fabricating electrically insulating micro-/nanostructures.
A Photocurable Leaky Dielectric Material for Highly Electrical Insulating Electrohydrodynamic Micro-/ Nanopatterns

Guolong Wang,Guowei Lv,Shihu Zhang,Jinyou Shao,Xiangming Li,Hongmiao,Tian,Demei Yu,Lifeng Zhang

2016-01-01

Abstract:A Photocurable Leaky Dielectric Material for Highly Electrical Insulating Electrohydrodynamic Micro-/Nanopatterns Guolong Wang,† Guowei Lv,† Shihu Zhang,† Jinyou Shao,‡ Xiangming Li,‡ Hongmiao Tian,‡ Demei Yu,*,† and Lifeng Zhang*,§ †Department of Applied Chemistry, School of Science, State Key Laboratory of Electrical Insulation and Power Equipment, School of Electrical Engineering, and ‡Microand Nanotechnology Research Center, State Key Laboratory of Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
Facile Fabrication of a Flexible Patterned Film with Diverse Micro-/Nanostructures via Electrohydrodynamic Patterning

Guowei Lv,Xiaobing Hu,Lu Hao,Hongmiao Tian,Jinyou Shao,Demei Yu

DOI: https://doi.org/10.1021/acs.iecr.0c04908

2021-01-01

Industrial & Engineering Chemistry Research

Abstract:To achieve facile fabrication of a flexible patterned film via electrohydrodynamic patterning (EHDP), a semiconducting photocurable resin (SCPR) was developed based on an optimized designed hyperbranched polymer and a photocurable monomer. It showed a low interface tension (34.185 mN/m), low viscosity (9.21 mPa.s), high dielectric constant (27.6), suitable conductivity (1.63 x 10(-5) S/cm), favorable wettability (a contact angle of 19.3 degrees), and film-forming property on an ITO-coated substrate. Benefitting from its excellent properties, a flexible patterned film with diverse micro-/nanostructures, including high-aspect ratio and/or small-feature-size pillar arrays, curvature-controllable aspheric microlens arrays, and hierarchical ordered pillar/pillar arrays, was rapidly manufactured via EHDP. Moreover, the characteristic wavelength decreased with the increasing applied voltage, decreasing electrode spacing, and increasing liquid film thickness, which was perfectly in accord with the leaky dielectric model of EHDP. This research provides an effective strategy for rapidly manufacturing a flexible patterned film with diverse micro-/nanostructures.
Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

G Lu,ZL Cao,ZW Lu,W Li,JM Yao,G Zhang,B Yang,JC Shen

DOI: https://doi.org/10.3321/j.issn:0251-0790.2002.12.034

2002-01-01

Abstract:A novel method using a combination of microcontact printing(muCP) technique, surface-directed condensation and surface-directed dewetting has been developed to fabricate patterned polymer films on gold substrates. These patterned polymer films can serve as resists in the argon ion etching effectively to transfer patterns into. the underlying gold substrates. This method is flexible in controlling the shape and feature size of the patterns in the polymer resists by simply adjusting the concentration of polymer solution, and especially it also provides a route to sub-micrometer sized features by using an original template with micrometer sized features.
A Sacrificial Layer Strategy for Photolithography on Highly Hydrophobic Surface and Its Application for Electrowetting Devices.

Han Zhang,Qiuping Yan,Qingyu Xu,Changshi Xiao,Xuelei Liang

DOI: https://doi.org/10.1038/s41598-017-04342-z

IF: 4.6

2017-01-01

Scientific Reports

Abstract:Patterning micro-structures on highly hydrophobic surface by photolithography is usually inevitable for fabricating devices based on electrowetting effects. The key challenges for such photolithography processes are how to coat photoresist uniformly and maintain the hydrophobicity of the highly hydrophobic surface, which are usually two contradict aspects. Moreover, the patterned microstructure must adhere to the highly hydrophobic surface excellently, which is critical for device application. However, a simple and robust fabrication process that fulfills all the above requirements was seldom reported. In this paper, we developed a sacrificial layer photolithography strategy on highly hydrophobic surface. Photoresist is easily coated uniformly all over the substrate by introducing a sacrificial layer between the photoresist and the highly hydrophobic surface. The hydrophobicity of the exposed hydrophobic surface was maintained and the adhesion of the microstructures to the substrate is excellent. An electrowetting display sample was demonstrated by this fabrication strategy, which showed dynamic image displaying with response time less than 40 ms. The strategy is applicable to both rigid and flexible substrate and manufacturing compatible. We believe our developed photolithography process is important for research and development of devices based on electrowetting effect.
Non-ultraviolet-based patterning of polymer structures by optically induced electrohydrodynamic instability

Feifei Wang,Haibo Yu,Na Liu,John D. Mai,Lianqing Liu,Gwo-Bin Lee,Wen Jung Li

DOI: https://doi.org/10.1063/1.4830001

IF: 4

2013-11-18

Applied Physics Letters

Abstract:We report here an approach to rapidly construct organized formations of micron-scale pillars from a thin polydimethylsiloxane (PDMS) film by optically induced electrohydrodynamic instability (OEHI). In OEHI, a heterogeneous electric field is induced across two thin fluidic layers by stimulating a photoconductive thin film in a parallel-plate capacitor configuration with visible light. We demonstrated that this OEHI method could control nucleation sites of pillars formed by electrohydrodynamic instability. To investigate this phenomenon, a tangential electric force component is assumed to have arisen from the surface polarization charge and is introduced into the traditional perfect dielectric model for PDMS films. Numerical simulation results showed that this tangential electric force played an important role in OEHI.

physics, applied
A New Strategy of Lithography Based on Phase Separation of Polymer Blends

Xu Guo,Long Liu,Zhe Zhuang,Xin Chen,Mengyang Ni,Yang Li,Yushuang Cui,Peng Zhan,Changsheng Yuan,Haixiong Ge,Zhenlin Wang,Yanfeng Chen

DOI: https://doi.org/10.1038/srep15947

IF: 4.6

2015-01-01

Scientific Reports

Abstract:Herein, we propose a new strategy of maskless lithographic approach to fabricate micro/nano-porous structures by phase separation of polystyrene (PS)/Polyethylene glycol (PEG) immiscible polymer blend. Its simple process only involves a spin coating of polymer blend followed by a development with deionized water rinse to remove PEG moiety, which provides an extremely facile, low-cost, easily accessible nanofabrication method to obtain the porous structures with wafer-scale. By controlling the weight ratio of PS/PEG polymer blend, its concentration and the spin-coating speed, the structural parameters of the porous nanostructure could be effectively tuned. These micro/nano porous structures could be converted into versatile functional nanostructures in combination with follow-up conventional chemical and physical nanofabrication techniques. As demonstrations of perceived potential applications using our developed phase separation lithography, we fabricate wafer-scale pure dielectric (silicon)-based two-dimensional nanostructures with high broadband absorption on silicon wafers due to their great light trapping ability, which could be expected for promising applications in the fields of photovoltaic devices and thermal emitters with very good performances and Ag nanodot arrays which possess a surface enhanced Raman scattering (SERS) enhancement factor up to 1.64 × 10 8 with high uniformity across over an entire wafer.
Pattern Formation in Thin Polymeric Films Via Electrohydrodynamic Patterning

Guowei Lv,Hongmiao Tian,Jinyou Shao,Demei Yu

DOI: https://doi.org/10.1039/d2ra01109c

IF: 4.036

2022-01-01

RSC Advances

Abstract:The free surface of a thin polymeric film is often unstable and deforms into various micro-/nano-patterns under an externally applied electric field. This paper reviews a recent patterning technique, electrohydrodynamic patterning (EHDP), a straightforward, cost-effective and contactless bottom-up method. The theoretical and numerical studies of EHDP are shown. How the characteristic wavelength and the characteristic time depend on both the external conditions (such as voltage, film thickness, template-substrate spacing) and the initial polymer properties (such as rheological property, electrical property and surface tension) is theoretically and experimentally discussed. Various possible strategies for fabricating high-aspect-ratio or hierarchical patterns are theoretically and experimentally reviewed. Aligning and ordering of the anisotropic polymers by EHDP is emphasized. A perspective, including novelty and limitations of the methods, particularly in comparison to some conventional patterning techniques, and a possible future direction of research, is presented.
Laminated Photoresist Sacrificial Layer Technology for MEMS

ZHANG Yong-hua,DING Gui-fu,JIANG Zheng,CAI Bing-chu,LAI Zong-sheng

DOI: https://doi.org/10.3969/j.issn.1004-1699.2006.05.029

2006-01-01

Abstract:Laminated photoresist sacrificial layer process has been developed to fabricate suspended micro-structures. Different problems related to the process such as air bubble, crack, crinkle, black floccule and adhesion are discussed and their solutions are proposed. The perfect suspended structure is successfully achieved utilizing wet release technology with in-sequence-removal method for the e tching of the laminated photoresist and in-sequence-displacement method forthe release of cantilever beam. The distance is about 10 μm from the substrate to the cantilever beam with a length of 1400 μm, a thickness of 6 μm and a width of 40 μm.
Photoresist as a choice of molecularly thin gate dielectrics in graphene-based devices

Minmin Zhou,Dehui Zhang,Dakuan Zhang,Huabin Sun,Zhe Liu,Tianhong Chen,Che-Hong Liu,Xinran Wang,Zhaohui Zhong,Yi Shi

DOI: https://doi.org/10.1063/5.0034996

IF: 6.6351

2021-03-01

APL Materials

Abstract:Ultra-thin polymeric dielectrics are of great interest for the ever-increasing development of high-performance novel electronics. Up to date, the fabrication of polymer layers as thin as few nanometers is still an extremely demanding process. Here, we report a facile method to fabricate molecularly thin (4 nm–5 nm) plasma-hardened photoresist (PHPR) layers by applying O2 plasma to treat the surface of the photoresist (SPR 220) to cross-link the constituent novolac resin. It is found that such ultra-thin PHPR layers also possess molecular-scale smoothness, superior chemical resistance, and thermal endurance. Furthermore, we develop an in situ transfer technique that is compatible with the planar process to stabilize the patterning of the PHPR layers. By using PHPR layers as the gate dielectric and tunneling barrier (breakdown strength up to 500 kV/mm), a graphene-PHPR-graphene (G-PHPR-G) sandwich-like structure is demonstrated, exhibiting a high photo-responsivity (>13 A/W) under low operating voltages (<1 V), which enables the ultra-thin PHPR layers to be a very promising candidate for the dielectrics in low-power, flexible electronic applications.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
Inkjet-Printed Dielectric Layer for the Enhancement of Electrowetting Display Devices

Hongwei Jiang,Rongzhen Qian,Tinghong Yang,Yuanyuan Guo,Dong Yuan,Biao Tang,Rui Zhou,Hui Li,Guofu Zhou

DOI: https://doi.org/10.3390/nano14040347

IF: 5.3

2024-02-12

Nanomaterials

Abstract:Electrowetting with a dielectric layer is commonly preferred in practical applications. However, its potential is often limited by factors like the properties of the dielectric layer and its breakdown, along with the complexity of the deposition method. Fortunately, advancements in 3D inkjet printing offer a more adaptable solution for making patterned functional layers. In this study, we used a negative photoresist (HN-1901) to create a new dielectric layer for an electrowetting display on a 3-inch ITO glass using a Dimatix DMP-2580 inkjet printer. The resulting devices performed better due to their enhanced resistance to dielectric breakdown. We meticulously investigated the physical properties of the photoresist material and printer settings to achieve optimal printing. We also controlled the uniformity of the dielectric layer by adjusting ink drop spacing. Compared to traditional electrowetting display devices, those with inkjet-printed dielectric layers showed significantly fewer defects like bubbles and electrode corrosion. They maintained an outstanding response time and breakdown resistance, operating at an open voltage of 20 V. Remarkably, these devices achieved faster response times of ton 22.3 ms and toff 14.2 ms, surpassing the performance of the standard device.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
Fabrication Of High-Aspect-Ratio Microstructures Using Dielectrophoresis-Electrocapillary Force-Driven Uv-Imprinting

Xiangming Li,Jinyou Shao,Hongmiao Tian,Yucheng Ding,Xiangmeng Li

DOI: https://doi.org/10.1088/0960-1317/21/6/065010

2011-01-01

Journal of Micromechanics and Microengineering

Abstract:We propose a novel method for fabricating high-aspect-ratio micro-/nano-structures by dielectrophoresis-electrocapillary force (DEP-ECF)-driven UV-imprinting. The force of DEP-ECF, acting on an air-liquid interface and an air-liquid-solid three-phase contact line, is generated by applying voltage between an electrically conductive mold and a substrate, and tends to pull the dielectric liquid (a UV-curable pre-polymer) into the mold micro-cavities. The existence of DEP-ECF is explained theoretically and demonstrated experimentally by the electrically induced reduction of the contact angle. Furthermore, DEP-ECF is proven to play a critical role in forcing the polymer to fill into the mold cavities by the real-time observation of the dynamic filling process. Using the DEP-ECF-driven UV-imprinting process, high-aspect-ratio polymer micro-/nano-structures (more than 10:1) are fabricated with high consistency. This patterning method can overcome the drawbacks of the mechanically induced mold deformation and position shift in conventional imprinting lithography and maximize the pattern uniformity which is usually poor in capillary force lithography.
Electrohydrodynamic Pressure Enhanced by Free Space Charge for Electrically Induced Structure Formation with High Aspect Ratio.

Hongmiao Tian,Chunhui Wang,Jinyou Shao,Yucheng Ding,Xiangming Li

DOI: https://doi.org/10.1021/la5027043

IF: 3.9

2014-01-01

Langmuir

Abstract:Electrically induced structure formation (EISF) is an interesting and unique approach for generating a microstructured duplicate from a rheological polymer by a spatially modulated electric field induced by a patterned template. Most of the research on EISF have so far used various dielectric polymers (with an electrical conductivity smaller than 10(-10) S/m that can be considered a perfect dielectric), on which the electric field induces a Maxwell stress only due to the dipoles (or bounded charges) in the polymer molecules, leading to a structure with a small aspect ratio. This paper presents a different approach for improving the aspect ratio allowed in EISF by doping organic salt into the perfect dielectric polymer, i.e., turning the perfect dielectric into a leaky dielectric, considering the fact that the free space charges enriched in the leaky dielectric polymer can make an additional contribution to the Maxwell stress, i.e., electrohydrodynamic pressure, which is desirable for high aspect ratio structuring. Our numerical simulations and experimental tests have shown that a leaky dielectric polymer, with a small conductivity comparable to that of deionized water, can be much more effective at being electrohydrodynamically deformed into a high aspect ratio in comparison with a perfect dielectric polymer when both of them have roughly the same dielectric constant.
Pattern formation in thin polymeric films via electrohydrodynamic patterning

Guowei Lv,Hongmiao Tian,Jinyou Shao,Demei Yu

DOI: https://doi.org/10.1039/d2ra01109c

IF: 4.036

2022-01-01

RSC Advances

Abstract:The free surface of a thin polymeric film is often unstable and deforms into various micro-/nano-patterns under an externally applied electric field. This paper reviews a recent patterning technique, electrohydrodynamic patterning (EHDP), a straightforward, cost-effective and contactless bottom-up method. The theoretical and numerical studies of EHDP are shown. How the characteristic wavelength and the characteristic time depend on both the external conditions (such as voltage, film thickness, template-substrate spacing) and the initial polymer properties (such as rheological property, electrical property and surface tension) is theoretically and experimentally discussed. Various possible strategies for fabricating high-aspect-ratio or hierarchical patterns are theoretically and experimentally reviewed. Aligning and ordering of the anisotropic polymers by EHDP is emphasized. A perspective, including novelty and limitations of the methods, particularly in comparison to some conventional patterning techniques, and a possible future direction of research, is presented.
Role of space charges inside a dielectric polymer in the electrohydrodynamic structure formation on a prepatterned polymer (ESF-PP)

Hongmiao Tian,Jinyou Shao,Hong Hu,Li Wang,Yucheng Ding

DOI: https://doi.org/10.1039/c6ra14479a

IF: 4.036

2016-01-01

RSC Advances

Abstract:Electrohydrodynamic structure formation on a prepatterned polymer (ESF-PP) can duplicate structures identical to the initial geometry, but with a higher aspect ratio, under the influence of a spatially modulated electric field. In this process, a voltage is applied between a flat template and a flat substrate, sandwiching a prepatterned polymer and an air gap so as to generate an electrohydrodynamic (EHD) force at the air-polymer interface. Subsequently, the prepatterned polymer can be non-uniformly pulled upwards, causing deformation in its micro/nano-structure. Until now, most of the research into ESF-PP has explored various dielectric polymers, which are all considered to be the perfect dielectrics because of their low electrical conductivity. However, the assumption of a perfect dielectric typically creates discrepancies between theoretical analysis and experimental results in terms of the polymer motion and the final morphology. This phenomenon can be attributed to ignoring the action of the small number of free space charges within dielectric polymer motion (although the electrical conductivity of the dielectric polymer may be even lower than that of deionized water), which emphasizes the importance of the influence of space charges inside the dielectric polymer on deformation. This paper explores the role of free space charges by making a comparison between the perfect dielectric polymer and the leaky dielectric polymer on the progressive development, the surface topography and the aspect ratio from experimental tests and numerical simulations, and a discussion of the effect of the different electrical conductivities. Results show that the free charges inside the dielectric polymer can lead to a larger EHD force because of the additional Coulomb force, even at a low conductivity of 10(-7) S m(-1), thus demonstrating the ability to duplicate a mushroom-like structure with a high aspect ratio, which has wide applications in superhydrophobicity, dry adhesion, nanogenerators, etc.
A Versatile Approach to Fabricate Modulated Micro-/Nanostructures by Electrohydrodynamic Structuring on Prepatterned Polymer

Hongmiao Tian,Jinyou Shao,Xiaoliang Chen,Li Wang,Yucheng Ding

DOI: https://doi.org/10.1088/1361-6439/aa4fd5

2016-01-01

Journal of Micromechanics and Microengineering

Abstract:Micro-/nanostructures fabricated on functional polymers from physical principles can be highly desirable for polymer devices, owing to the physical integrity of the generated structure, the process economy and their environmentally friendly quality. However, current fabricating approaches can only duplicate a specific structure, or may require a complex technological procedure for the fabrication, i.e. for the fabrication of modulated micro-/nanostructures on polymer films on the basis of the physical principles, a versatile yet simple procedure is lacking. In this paper, electrohydrodynamic structuring on prepatterned polymer (ESPP) based on the electrohydrodynamic behavior of fluidic polymers in an electric field is proposed for the fabrication of a modulated structure on a functional polymer. For this purpose, a voltage is applied between a flat template and a flat substrate, sandwiching a prepatterned polymer and an air gap, resulting in a non-uniform upward pull on the polymer. This leads to a deformation of the polymer resulting in a structure corresponding to the initial morphology. This study explores the capability of ESPP in duplicating modulated structures by manipulating the electric field (which is also influenced by process parameters involving voltage and air gap length) from the perspective of theoretical analysis and experimental tests, which categorize the relationship between electrohydrodynamic pressure and surface tension into two regimes: one consisting of equilibrium modulation for convex structures potentially used as microlens arrays, and another comprising non-equilibrium modulation for high aspect ratio structures and potentially applicable to dry adhesives, superhydrophobic surfaces, etc. Furthermore, a criterion is proposed to distinguish between the two aforementioned regimes.
Formula Design of Hyperbranched Polyarylether‐Based Low Dielectric Photosensitive Resin and Study of UV‐Cured Films Properties

Lingmei Jiang,Chenghao Wang,Changhong Xiao,Guangsheng Zhang,Yibo Wang,Haoran Liu,Kuanyu Yuan,Lishuai Zong,Jinyan Wang,Xigao Jian

DOI: https://doi.org/10.1002/pat.6598

IF: 3.348

2024-10-31

Polymers for Advanced Technologies

Abstract:For large‐area electronic and high shape complexity structure applications, various solution‐processable materials are chosen as dielectric layer due to their simple molding process via spin‐coating, casting, or 3D printing at room temperature. Herein, the acrylic‐ended fluorinated hyperbranched polyaryletherketone (hb‐P6FAEK‐Ace) was used as the prepolymer and then, the composition of photosensitive resin formula was regulated by adjusting the addition ratio of hb‐P6FAEK‐Ace and diluents (acrylimorpholine [ACMO] 1,6‐Hexanediol diacrylate [HDDA]). These photosensitive resin solutions showed the relative low viscosities ranged ranging from 18 to 253 mPa S at 100°C which was in favor of the future 3D printing method and printing accuracy. Then, the obtained UV‐cured films show the maximum tensile strength up to 71.9 MPa and superior thermal properties with the Tg of 157°C–177°C and T5% of 314°C–351°C. Moreover, they also exhibited the good dielectric performance with dielectric constants of 2.43–2.20 and dielectric loss of 0.013–0.014 at 1 MHz–1 GHz. These abovementioned satisfactory performance could be ascribed to the aromatic skeleton of hb‐P6FAEK‐Ace, introduced polarizability‐CF3 groups and the inner cavities for the hyperbranched structures, also the precise control of formula composition. Additionally, the curing degree, shrinkage of solid, and moisture properties were also researched thoroughly. This work provides a simple formula design though to construct the high performance and low dielectric photosensitive resin for the requirements of microelectronic applications.

polymer science
Indirect removal of SU-8 photoresist using PDMS technique

Jianhua Li,Di Chen,Jinya Zhang,Jingquan Liu,Jun Zhu

DOI: https://doi.org/10.1016/j.sna.2005.07.012

2006-01-01

Abstract:SU-8 photoresist shows superior images for thick film lithography and has been utilized as an electroplating mold. However, crosslinked SU-8 is difficult to remove reliably from high-aspect-ratio microstructures (HARMs) without damage or alteration to the electroplated metal. In this paper, an indirect SU-8 removal method is proposed. Instead of directly using SU-8 microstructure as the electroplating mold, a polydimethysiloxane (PDMS) replica is employed. The metallic micromold insert obtained through this method can be easily peeled off from the PDMS replica, meanwhile with high resolution and smooth surfaces.
Photolithographic Patterning of Cytop with Limited Contact Angle Degradation.

Yalei Qiu,Shu Yang,Kuang Sheng

DOI: https://doi.org/10.3390/mi9100509

IF: 3.4

2018-01-01

Micromachines

Abstract:Cytop is a commercially available amorphous fluoropolymer with excellent characteristics including electric insulation, water and oil repellency, chemical resistance, and moisture-proof property, making it an attractive material as hydrophobic layers in electrowetting-on-dielectric (EWOD) devices. However, its highly hydrophobic surface makes it difficult for photoresists to be directly coated on the surface. To pattern Cytop, plasma treatment prior to applying photoresists is required to promote the adhesion between the photoresist and the Cytop coating. This approach inevitably causes hydrophobicity loss in the final EWOD devices. Thus, a damage-reduced recipe for Cytop patterning is urgently needed. In this paper, we first characterized the damage caused by two categories of surface treatment methods: plasma treatment and metal treatment. Parameters such as plasma gas source (Ar/O2), plasma treatment time (0–600 s), metal target (Al/Cu/Cr/Au), metal deposition process (magnetron sputtering or e-beam evaporation) were varied. Film thickness, wettability, and roughness were quantified by ellipsometry measurements, contact angle measurements, and atom force microscope (AFM), respectively. We then evaluated the effectiveness of annealing in damage reduction. Experimental results show that: (1) annealing is necessary in restoring hydrophobicity as well as smoothing surfaces; (2) specified film thickness can be obtained by controlling plasma treatment time; (3) “Ar/O2 plasma treatment + an AZ5214 soft mask + annealing” is a feasible recipe; (4) “an Al/Cu/Cr/Au hard mask + annealing” is feasible as well.

Preparation, Properties, and Efficient Electrically Induced Structure Formation of A Leaky Dielectric Photoresist

Rapid Fabrication of Electrohydrodynamic Micro-/Nanostructures with High Aspect Ratio Using a Leaky Dielectric Photoresist

A Photocurable Leaky Dielectric for Highly Electrical Insulating Electrohydrodynamic Micro-/Nanopatterns

A Photocurable Leaky Dielectric Material for Highly Electrical Insulating Electrohydrodynamic Micro-/ Nanopatterns

Facile Fabrication of a Flexible Patterned Film with Diverse Micro-/Nanostructures via Electrohydrodynamic Patterning

Fabrication of Patterned Polymer Resists for Ion Etching by Using Dewetting

A Sacrificial Layer Strategy for Photolithography on Highly Hydrophobic Surface and Its Application for Electrowetting Devices.

Non-ultraviolet-based patterning of polymer structures by optically induced electrohydrodynamic instability

A New Strategy of Lithography Based on Phase Separation of Polymer Blends

Pattern Formation in Thin Polymeric Films Via Electrohydrodynamic Patterning

Laminated Photoresist Sacrificial Layer Technology for MEMS

Photoresist as a choice of molecularly thin gate dielectrics in graphene-based devices

Inkjet-Printed Dielectric Layer for the Enhancement of Electrowetting Display Devices

Fabrication Of High-Aspect-Ratio Microstructures Using Dielectrophoresis-Electrocapillary Force-Driven Uv-Imprinting

Electrohydrodynamic Pressure Enhanced by Free Space Charge for Electrically Induced Structure Formation with High Aspect Ratio.

Pattern formation in thin polymeric films <i>via</i> electrohydrodynamic patterning

Role of space charges inside a dielectric polymer in the electrohydrodynamic structure formation on a prepatterned polymer (ESF-PP)

A Versatile Approach to Fabricate Modulated Micro-/Nanostructures by Electrohydrodynamic Structuring on Prepatterned Polymer

Formula Design of Hyperbranched Polyarylether‐Based Low Dielectric Photosensitive Resin and Study of UV‐Cured Films Properties

Indirect removal of SU-8 photoresist using PDMS technique

Photolithographic Patterning of Cytop with Limited Contact Angle Degradation.