Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate

Hidetoshi Takahashi,Tetsuo Kan,Gayeong Lee,Nilsu Dönmez,Jieun Kim,Jihoon Park,Dongwook Kim,Yun Jung Heo
DOI: https://doi.org/10.35848/1882-0786/ab9ba3
IF: 2.819
2020-06-22
Applied Physics Express
Abstract:This work presents self-focusing 3D lithography based on the refractive index changes ofpolyethylene glycol diacrylate (PEGDA) during photopolymerization. Since the polymerization of PEGDAleads to an increase in the refractive index, the UV light rays in the PEGDA undergo a refractioneffect during exposure, thus being focused and forming 3D photopolymerized structures. Wedemonstrate the potential of self-focusing 3D lithography by fabricating PEGDA microneedles andtrapezoid-shaped microwells. Their structures well match our theoretical estimation. Therefore, ourtheoretical approach can provide a short route to realizing on-demand, complicated 3D structures ofrefractive-index-variable materials with single UV exposure.
physics, applied
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