Understanding the Anomalous Thermoelectric Behavior of Fe-V-W-Al-Based Thin Films

Kavita Yadav,Yuya Tanaka,Artoni Kevin R. Ang,Kotaro Hirose,Masahiro Adachi,Masaharu Matsunami,Tsunehiro Takeuchi
DOI: https://doi.org/10.1021/acsami.4c06329
IF: 9.5
2024-09-15
ACS Applied Materials & Interfaces
Abstract:We investigated the thermoelectric and thermal behavior of Fe-V-W-Al-based thin films prepared using the radio frequency magnetron sputtering technique at different oxygen pressures (0.1-1.0 × 10^(-2) Pa) and on different substrates (n, p, and undoped Si). Interestingly, at lower oxygen pressure, formation of a bcc-type Heusler structure was observed in deposited samples, whereas at higher oxygen pressure, we have noted the development of an amorphous structure in these samples. Our findings...
materials science, multidisciplinary,nanoscience & nanotechnology
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