Titanium oxide crystallization and interface defect passivation for high performance insulator-protected Schottky junction MIS photoanodes.

Andrew G Scheuermann,John P Lawrence,Andrew C Meng,Kechao Tang,Olivia L Hendricks,Christopher E D Chidsey,Paul C McIntyre
DOI: https://doi.org/10.1021/acsami.6b03688
IF: 9.5
2016-01-01
ACS Applied Materials & Interfaces
Abstract:Atomic layer deposited (ALD) TiO2 protection layers may allow for the development of both highly efficient and stable photoanodes for solar fuel synthesis; however, the very different conductivities and photovoltages reported for TiO2-protected silicon anodes prepared using similar ALD conditions indicate that mechanisms that set these key properties are, as yet, poorly understood. In this report, we study hydrogen-containing annealing treatments and find that post-catalyst-deposition anneals at intermediate temperatures reproducibly yield decreased oxide/silicon interface trap densities and high photovoltage. A previously-reported insulator thickness-dependent photovoltage loss in metal-insulator-semiconductor Schottky junction photoanodes is suppressed, and this occurs simultaneously with TiO2 crystallization and an increase in its dielectric constant. At small insulator thickness, a record for a Schottky junction photoanode of 623 mV photovoltage is achieved, yielding a photocurrent turn-on at 0.92 V vs NHE or -0.303 V with respect to the thermodynamic potential for water oxidation.
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