Direct Patterning of Organic Functional Polymers Through Conventional Photolithography and Noninvasive Cross‐Link Agents

Marco A. Squillaci,Feng Qiu,Alessandro Aliprandi,Fan Zhang,Xinliang Feng,Paolo Samori
DOI: https://doi.org/10.1002/adma.201600329
IF: 29.4
2016-01-01
Advanced Materials
Abstract:A new technique for direct patterning of functional organic polymers using commercial photolithography setups with a minimal loss of the materials' performances is reported. This result is achieved through novel cross-link agents made by boron- and fluorine-containing heterocycles that can react between themselves upon UV- and white-light exposure.
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