Dielectric Properties of Pure and Gd‐Doped HfO2 Ceramics

Chunchang Wang,Da Zhang,Hong Wang,Yi Yu,Yide Li,Qiuju Li

DOI: https://doi.org/10.1111/jace.13846

IF: 4.186

2015-01-01

Journal of the American Ceramic Society

Abstract:The pure, 2 at.%, and 20 at.% Gd‐doped HfO2 ceramics were prepared by the standard solid‐state reaction technique. Dielectric properties of these ceramics were investigated in the temperature range 300–1050 K and frequency range 20–5 × 106 Hz. Our results revealed an intrinsic dielectric constant around 20 in the temperature below 450 K for all tested ceramics. Two oxygen‐vacancy‐related relaxations R1 and R2 were observed at temperatures higher than 450 K, which were identified to be a dipolar relaxation due to grain response and a Maxwell–Wagner relaxation due to grain‐boundary response, respectively. The dielectric properties of the pure and slightly doped (2 at.%,) samples are dominated by the grain‐boundary response, which results in a colossal dielectric behavior similar to that found in CaCu3Ti4O12. The doping level of 20 at.% leads to the structural transformation from monoclinic phase to cubic phase. The dielectric properties of the heavily doped HfO2 are dominated by the grain response without any colossal dielectric behavior.