Evolution of Interfacial Properties with Annealing in InAs/GaSb Superlattice Probed by Infrared Photoluminescence

Xiren Chen,Yi Zhou,Liang Zhu,Zhen Qi,Qingqing Xu,Zhicheng Xu,Shaoling Guo,Jianxin Chen,Li He,Jun Shao
DOI: https://doi.org/10.7567/jjap.53.082201
IF: 1.5
2014-01-01
Japanese Journal of Applied Physics
Abstract:Postgrowth rapid-annealing effects are investigated by infrared photoluminescence (PL) in the InAs/GaSb type-II superlattice (T2SL) with intentional InSb interfaces. The changes in PL energy, linewidth, and integral intensity with temperature indicate that the PL process is dominated by electron–phonon interaction in the InSb-like interfaces and adjacent narrow portions of InAs layers. The interfacial electron level serves as a thermal escape channel for the first miniband electrons and affects the T2SL high-temperature properties. Annealing promotes the interfacial atom exchange and changes the electron thermal escape energy. It transforms the PL-related interfacial regions to InSb1−xAsx at annealing temperatures below 470 °C, activates In/Ga exchange, and transforms the regions to In1−yGaySb at 500 °C. The results indicate that an optimized annealing temperature is crucial for improving the T2SL performance by postgrowth annealing, and infrared PL can serve as an effective criterion for the optimization.
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