Behavior of Low-Frequency Noise in N-Channel Metal–Oxide–Semiconductor Field-Effect Transistors for Different Impurity Concentrations

Ranga Hettiarachchi,Takeo Matsuki,Wei Feng,Keisaku Yamada,Kenji Ohmori
DOI: https://doi.org/10.1143/jjap.50.10pb04
IF: 1.5
2011-01-01
Japanese Journal of Applied Physics
Abstract:In this study, we investigated the behavior of the low-frequency noise of n-channel metal–oxide–semiconductor field-effect transistors as a function of gate overdrive from the viewpoints of subthreshold slope and normalized transconductance. We prepared devices with different uniformities of channel impurity, carrier mobility, and the degree of the short-channel effect by halo implantation and changing the substrate impurity concentration and gate length. It was found that the small subthreshold swing value increases the slope of noise intensity in the subthreshold regime, probably resulting from random nature of the diffusion transport. On the other hand, the magnitude of noise intensity in the strong inversion regime is related to the normalized transconductance, where a small number of scattering events in the channel realize low noise intensity.
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