Domain Switching and Effects in Bifeo3 Thin Film on A Pt/Ti/Sio2/Si (111) Substrate

Fei Fan,Bingcheng Luo,Mengmeng Duan,Changle Chen
DOI: https://doi.org/10.6122/cjp.51.834
IF: 3.957
2013-01-01
Chinese Journal of Physics
Abstract:Piezoelectric force microscopy (PFM) has been used to perform nanoscale studies of the domain configuration and switching behavior of the BiFeO3 (BFO) thin film deposited on a Pt/Ti/SiO2/Si (111) substrate using the rf magnetron sputtering technique. The PFM images illustrated the complete domain configuration. The electric field dependent polarization switch experiments were carried out. It was found that upward domains were dominant in our sample. The higher positive dc biases, + 8 V and + 10 V, successfully switched the ferroelectric domains downward, and some unexpected polarization switching of the adjacent domains out of the poling region was ascribed to the long-range interaction of the domain walls as well as the domain growth near the grain boundaries.
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