A Low-Cost Infrared Absorbing Structure for an Uncooled Infrared Detector in A Standard Cmos Process

Shen Ning,Tang Zhen'an,Yu Jun,Huang Zhengxing
DOI: https://doi.org/10.1088/1674-4926/35/3/034014
2014-01-01
Journal of Semiconductors
Abstract:This paper introduces a low-cost infrared absorbing structure for an uncooled infrared detector in a standard 0.5 mu m CMOS technology and post-CMOS process. The infrared absorbing structure can be created by etching the surface sacrificial layer after the CMOS fabrication, without any additional lithography and deposition procedures. An uncooled infrared microbolometer is fabricated with the proposed infrared absorbing structure. The microbolometer has a size of 65 x 65 mu m(2) and a fill factor of 37.8%. The thermal conductance of the microbolometer is calculated as 1.33 x 10(-5) W/K from the measured response to different heating currents. The fabricated microbolometer is irradiated by an infrared laser, which is modulated by a mechanical chopper in a frequency range of 10-800 Hz. Measurements show that the thermal time constant is 0.995 ms and the thermal mass is 1.32 x 10(-8) J/K. The responsivity of the microbolometer is about 3.03 x 10(4) V/W at 10 Hz and the calculated detectivity is 1.4 x 10(8) cm.Hz (1/2)/W.
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