Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Investigation of UV Laser-Induced Damage by Precursors at the Surface of LBO Crystal

Laser damage properties of LiB_3O_5 crystal surface under UV laser irradiation

Improvement and Formation of UV-induced Damage on LBO Crystal Surface During Long-Term High-Power Third-Harmonic Generation

Analysis and Experimental Investigation of Laser Induced Damage of Optics

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Laser Damage Induced by Contamination Particles on Coated Optical Components

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Investigation Of Nonlinear Absorption And Laser Damage On Lithium-Niobate Single-Crystals

Damage Morphologies of Al2O3 and Fe Particles Attached on the Input Surface of Fused Silica after Irradiation by a 355 Nm Laser.

First-principles Study of Metallic Impurities Induced 355 Nm UV Laser Absorption in Fused Silica

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica

Influence of bulk defects on bulk damage performance of fused silica optics at 355 nm nanosecond pulse laser

Laser-Induced Damage Initiation and Growth of Optical Materials

Strong UV laser absorption source near 355 nm in fused silica and its origination

Study on Thermal Damage to Balsaming Lens Induced by Multi-Pulse Laser

Investigation on the influence of the CO2 laser parameters on the defect healing process of fused silica

Investigation of the Multimechanism Laser Cleaning Dynamics for Rough Fused Silica Surfaces with Organic Contaminants: A Computational Simulation and Atomic Analysis.

Combined Modulation of Incident Laser Light by Multiple Surface Scratches and Their Effects on the Laser Damage Properties of KH2PO4 Crystal.

The Photo-Thermal Absorbing Influence on Introducing Laser-Damaging of the Fused Silica

Contrast Study of Laser-induced Damage of Monolayer SiO2 and ZrO2 Films