Light Scattering by Textured Al-Doped Zinc Oxide Film for Thin Film Silicon Solar Cells Coated on Glass Substrates
Deng Kui Miao,Qing Nan Zhao,Yu Hong Dong,Wen Hui Yuan,Lei Wu,Hong Yu Liang,Bin Wang,Xiu Qiang Lu
DOI: https://doi.org/10.4028/www.scientific.net/kem.509.279
2012-04-01
Key Engineering Materials
Abstract:ZnO:Al thin films were deposited on low-iron glass substrates (size: 1100×1400 mm2 ) in an in-line sputtering system, using ZnO:Al ceramic targets. The initially smooth films exhibit high transparencies (T≥85% for visible light) and excellent electrical properties (carrier concentration N=3.810×1020cm-3, mobility μ=20.47 cm2/V•s). The films, etched by diluted HCl for different time, appear roughness morphology with suitable angles and crater structure, used for controlling the light scattering properties of the textured ZnO:Al films. Moreover, the electrical properties are not affected by the etching process. Thus, it is possible to optimize separately the electro-optical and light trapping properties. The textured ZnO:Al films (haze 21.2%, 550 nm) were used as front contacts for amorphous silicon thin film solar cells prepared by PECVD, 6.5% conversion efficiency were obtained.