Abstract:The Ni‐PTFE mold is a nanocomposite mold fabricated by one‐pot electroforming using anodic aluminum oxide (AAO) foil as a template. It has low surface energy and low surface wettability, enabling precise, defect‐free nanopatterns down to 100 nm over 20 cycles of thermal nanoimprinting (T‐NIL). UV‐NIL also succeeded, with the nanocomposite mold exhibiting superior demolding compared to a silane‐coated Ni mold. Nanoimprinting large‐area structures, especially high‐density features like meta lenses, poses challenges in achieving defect‐free nanopatterns. Conventional high‐resolution molds for nanoimprinting are often expensive, typically constructed from inorganic materials such as silicon, nickel (Ni), or quartz. Unfortunately, replicated nanostructures frequently suffer from breakage or a lack of definition during demolding due to the high adhesion and friction at the polymer‐mold interface. Moreover, mold degradation after a limited number of imprinting cycles, attributed to contamination and damaged features, is a common issue. In this study, a disruptive approach is presented to address these challenges by successfully developing an anti‐sticking nanocomposite mold. This nanocomposite mold is created through the co‐deposition of nickel atoms and low surface tension polytetrafluoroethylene (PTFE) nanoparticles via electroforming. The incorporation of PTFE enhances the ease of polymer release from the mold. The resulting Ni‐PTFE nanocomposite mold exhibits exceptional lubrication properties and a significantly reduced surface energy. This robust nanocomposite mold proves effective in imprinting fine, densely packed nanostructures down to 100 nm using thermal nanoimprinting for at least 20 cycles. Additionally, UV nanoimprint lithography (UV‐NIL) is successfully performed with this nanocomposite mold. This work introduces a novel and cost‐effective approach to reusable high‐resolution molds, ensuring defect‐reduction production in nanoimprinting.

High Resolution Soft Mold for UV-curing Nanoimprint Lithography Using an Oxygen Insensitive Degradable Material

Self-Collapse Lithography

An Oxygen-Insensitive Degradable Resist for Fabricating Metallic Patterns on Highly Curved Surfaces by Uv-Nanoimprint Lithography

Fabrication of Flexible Mold for Hybrid Nanoimprint-Soft Lithography

A Degradable Polycyclic Cross-Linker for UV-curing Nanoimprint Lithography

A "thiol-ene" photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

Rapid Prototyping of Soft Lithography Masters for Microfluidic Devices Using Dry Film Photoresist in a Non-Cleanroom Setting

Selection of di(meth)acrylate monomers for low pollution of fluorinated mold surfaces in ultraviolet nanoimprint lithography

Surface energy-tunable iso decyl acrylate based molds for low pressure-nanoimprint lithography

Hybrid nanoimprint-soft lithography with sub-15 nm resolution.

Sub-50 nm UV-curing nanoimprint based on fluoropolymer, CYTOP, mold

Importance of Molds for Nanoimprint Lithography: Hard, Soft, and Hybrid Molds

A Sandwiched Flexible Polymer Mold for Control of Particle-Induced Defects in Nanoimprint Lithography

Low-cost, durable master molds for thermal-NIL, UV-NIL, and injection molding

A Tunable Nanoimprint System to Create New Features

3D printing of release-agent retaining molds

High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps

Micro/nanofabrication of Brittle Hydrogels Using 3D Printed Soft Ultrafine Fiber Molds for Damage-Free Demolding.

Low-Shrinkage and Degradable UV Imprint Lithography Based on Biomass-Derived Epoxidized Soybean Oil and Cardanol

Toward Defect‐Free Nanoimprinting

Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds