Nonpolar Growth And Characterization Of Inn Overlayers On Vertically Oriented Gan Nanorods
Xian Sun,Desheng Jiang,Wenbao Liu,JiHong Zhu,Hui Wang,Zongshun Liu,Jianjun Zhu,Yutian Wang,Degang Zhao,,Shuming Zhang,Liping You,Renmin Ma,Hui Yang
DOI: https://doi.org/10.1063/1.3177347
IF: 2.877
2009-01-01
Journal of Applied Physics
Abstract:Nanostructured hexagonal InN overlayers were heteroepitaxially deposited on vertically oriented c-axis GaN nanorods by metal-organic chemical vapor deposition. InN overlayers grown in radial directions are featured by a nonpolar heteroepitaxial growth mode on GaN nanorods, showing a great difference from the conventional InN growth on (0001) c-plane GaN template. The surface of InN overlayers is mainly composed of several specific facets with lower crystallographic indices. The orientation relationship between InN and GaN lattices is found to be [0001](InN) parallel to [0001](GaN) and [1100](InN)parallel to[1100](GaN). A strong photoluminescence of InN nanostructures is observed. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3177347]