Ultrahigh-Density Beta-Ga2o3/N-Doped Beta-Ga2o3 Schottky and P-N Nanowire Junctions: Synthesis and Electrical Transport Properties

Li-Wei Chang,Ching-Fei Li,Yun-Tsung Hsieh,Chia-Ming Liu,Yi-Ting Cheng,Jien-Wei Yeh,Han C. Shih
DOI: https://doi.org/10.1149/1.3530787
IF: 3.9
2011-01-01
Journal of The Electrochemical Society
Abstract:We describe the fabrication of ultrahigh-density beta-Ga2O3 Schottky and N-doped beta-Ga2O3/beta-Ga2O3 p-n nanowire junctions via microwave plasma enhanced chemical vapor deposition and thermal chemical vapor deposition. The electron transport mechanisms with Schottky and p-n nanowire junctions were characterized by current-voltage (I-V-sd) measurements. The I-V-sd curve of different amount of the nanowires is greatly influenced by the potential barriers on the gap of Schottky nanowire junctions. N-2 plasma treatment led to rectifying electrical characteristics, suggesting that near surface was compensated by ion-induced deep-level states, which can be verified by cathodoluminescence spectrum. The current transport through p-n nanowire junctions is dominated by the deep-level-assisted tunneling mechanism for -0.8 V < V-sd < 0.6 V and by the space-charge limited conductive mechanism beyond 0.6 V. The detailed I-V-sd characteristics of the p-n nanowire junctions have been investigated in the temperature range 323-373 K. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3530787] All rights reserved.
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