Enhanced Post-Annealing Stability of Perpendicular Ta/CoFeB/Mg/MgO Multilayers by Inhibiting Ta Diffusion

Xu-Jing Li,Shao-Long Jiang,Jing-Yan Zhang,Qian-Qian Liu,Yi-Wei Liu,Jian-Cheng Zhao,Zheng-Long Wu,Chun Feng,Ming-Hua Li,Guang-Hua Yu
DOI: https://doi.org/10.1016/j.apsusc.2016.01.032
IF: 6.7
2016-01-01
Applied Surface Science
Abstract:To reveal the underlying mechanism of Mg influence on the enhanced post-annealing stability of perpendicular Ta/CoFeB/Mg/MgO multilayers, the X-ray photoelectron spectroscopy analysis has been performed. It is found that a certain amount of Mg interlayer at the CoFeB/MgO interface could prevent the Ta oxidation, and consequently lower the diffusion motivation of Ta from the bottom layer to the CoFeB/MgO interfaces to some extent in the annealing process. The prevention of Ta diffusion realizes the effective hybridization of Fe and O at the CoFeB/MgO interface and maintains interfacial magnetic anisotropy (KCoFeB/MgO). As a result, the perpendicular magnetic anisotropy at high annealing temperatures is maintained (C) 2016 Elsevier B.V. All rights reserved.
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