Abstract:Arrays of sharp conical spike microstructures are created by repeatedly irradiating silicon surfaces with focused femtosecond laser pulses in SF6. The absorbance of light is increased to approximately 90% in a wavelength range from the near ultraviolet (0.25 m) to the near infrared (2.5 m) by the microstructured silicon surface. The microstructured surface presents pitch-black because of enhanced absorption with a broad wavelength range, which is called black silicon. The unique microstructure morphology of black silicon surface formed by femtosecond laser can also bring a lot of other surface functions, for example, self-cleaning and field emission. These functions make black silicon highly desirable in solar energy, detectors and other fields. Therefore, the forming mechanism and conditions of fabrication optimization for black silicon microstructure have always been the focus of research. In our work, the sample is moved by motor-controlled stage while the laser beam is fixed. In the case of laser beam scanning, arrays of sharp conical spikes on the silicon are manufactured in 70 kPa SF6. The aim of the experiment is to find how to optimize the distribution of the laser energy in a number of laser accumulation pulses (the combination of single pulse energy and pulse number) to control the surface morphology of the black silicon. Experimental results show that there appears a bottleneck effect of morphology size growth with the increase of laser irradiation (improving the single pulse energy or increasing pulse accumulation number). Excessive energy accumulation brings no extra effect on optimizing and controlling of microstructure morphology on the surface. Based on theoretical results obtained from a physical model we proposed, we find that the reason for this phenomenon is that the microstructure morphology induced by former sequence pulse modulates the laser energy absorption of current laser pulse, and changes the laser ablation efficiency of the current pulse. According to this physical mechanism, we propose a new way of optimizing surface morphology, with fixing the total laser irradiation energy. And the size and distribution of surface morphology can be achieved by optimizing the distribution of the laser energy in a number of laser accumulation pulses. This approach can not only improve the efficiency of silicon surface preparation of microstructures but also reduce the surface defects and damage. Furthermore, the proposed method can reduce the energy consumption in the process of femtosecond machining. It is of great significance for the engineering application of black silicon.

Black Silicon Created by Interfered Femtosecond Laser Illumination

Femtosecond Laser Pulse Energy Accumulation Optimization Effect on Surface Morphology of Black Silicon

Periodic Silicon Surface Structures Fabricated by Infrared Nanosecond Pulse Laser Ablation in Ambient Air for Enhanced Anti-Reflection

Progressive Evolution of Silicon Surface Microstructures Via Femtosecond Laser Irradiation in Ambient Air

Femtosecond Laser Fabricating Black Silicon in Alkaline Solution

Multi-scale Micro-Nano Structures Prepared by Laser Cleaning Assisted Laser Ablation for Broadband Ultralow Reflectivity Silicon Surfaces in Ambient Air

Effects of the Irradiation on Silicon by Femtosecond Laser of Various Energy Densities

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Deposition and Melting Behaviors for Formation of Micro/nano Structures from Nanostructures with Femtosecond Pulses

Functional Performance of Silicon with Periodic Surface Structures Induced by Femtosecond Pulsed Laser

Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance

Femtosecond Laser-Induced Mesoporous Structures on Silicon Surface

Influence of Femtosecond Laser Pulse Energy on the Surface Reflection of Black Silicon in Alkaline Solution

Large-Scale Black Silicon Induced by Femtosecond Laser Assisted With Laser Cleaning

Fabrication of Black Silicon with Thermostable Infrared Absorption by Femtosecond Laser

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Femtosecond Laser Induced Surface Structuring on Silicon by Diffraction-Assisted Micropatterning

Remote and Rapid Micromachining of Broadband Low-Reflectivity Black Silicon Surfaces by Femtosecond Laser Filaments.

Fabrication of Two-Dimensional Periodic Structures on Silicon after Scanning Irradiation with Femtosecond Laser Multi-Beams

Extreme Sub-Wavelength Structure Formation from Mid-IR Femtosecond Laser Interaction with Silicon

Direct and Stand-off Fabrication of Black Silicon with Enhanced Absorbance in the Short-Wavelength Infrared Region Using Femtosecond Laser Filament