Effect of Low-Damage Inductively Coupled Plasma on Shallow Nitrogen-Vacancy Centers in Diamond

Felipe Favaro de Oliveira,S. Ali Momenzadeh,Ya Wang,Mitsuharu Konuma,Matthew Markham,Andrew M. Edmonds,Andrej Denisenko,Joerg Wrachtrup
DOI: https://doi.org/10.1063/1.4929356
IF: 4
2015-01-01
Applied Physics Letters
Abstract:Near-surface nitrogen-vacancy (NV) centers in diamond have been successfully employed as atomic-sized magnetic field sensors for external spins over the last years. A key challenge is still to develop a method to bring NV centers at nanometer proximity to the diamond surface while preserving their optical and spin properties. To that aim we present a method of controlled diamond etching with nanometric precision using an oxygen inductively coupled plasma process. Importantly, no traces of plasma-induced damages to the etched surface could be detected by X-ray photoelectron spectroscopy and confocal photoluminescence microscopy techniques. In addition, by profiling the depth of NV centers created by 5.0 keV of nitrogen implantation energy, no plasma-induced quenching in their fluorescence could be observed. Moreover, the developed etching process allowed even the channeling tail in their depth distribution to be resolved. Furthermore, treating a 12C isotopically purified diamond revealed a threefold increase in T2 times for NV centers with <4 nm of depth (measured by nuclear magnetic resonance signal from protons at the diamond surface) in comparison to the initial oxygen-terminated surface.
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