The Atomic Structure And Polarization Of Strained Srtio3/Si

d p kumah,james w reiner,yaron segal,alexie m kolpak,zhibo zhang,d su,yiqing zhu,maciej sawicki,christine broadbridge,chong h ahn,f j walker
DOI: https://doi.org/10.1063/1.3529460
IF: 4
2010-01-01
Applied Physics Letters
Abstract:For thin film devices based on coupling ferroelectric polarization to charge carriers in semiconductors, the role of the interface is critical. To elucidate this role, we use synchrotron x-ray diffraction to determine the interface structure of epitaxial SrTiO3 grown on the (001) surface of Si. The average displacement of the O octahedral sublattice relative to the Sr sublattice determines the film polarization and is measured to be about 0.05 nm toward the Si, with Ti off-center displacements 0.009 nm away from the substrate. Measurements of films with different boundary conditions on the top of the SrTiO3 show that the polarization at the SrTiO3/Si interface is dominated by oxide-Si chemical interactions. (C) 2010 American Institute of Physics. [doi:10.1063/1.3529460]
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