1.55Μm InAs Quantum Dots Grown on a GaAs Substrate Using a GaAsSb Metamorphic Buffer Layer

H. Y. Liu,Y. Qiu,C. Y. Jin,T. Walther,A. G. Cullis
DOI: https://doi.org/10.1063/1.2898895
IF: 4
2008-01-01
Applied Physics Letters
Abstract:The use of a GaAsSb metamorphic buffer layer (MBL) is demonstrated to significantly enhance the room-temperature photoluminescence intensity for 1.55μm metamorphic InAs∕GaAs quantum dots (QDs) in comparison with a conventional InGaAs MBL. A dramatic reduction of QD photoluminescence emission efficiency above 1.5μm has been observed at room temperature when the indium composition in the InxGa1−xAs MBL is increased over x=0.25. By using a GaAsSb buffer instead of InGaAs, we demonstrate a strong enhancement of photoluminescence intensity of InAs∕GaAs QDs. The effects of the GaAsSb MBL can be understood in terms of smoothing the surface morphology of the buffer layer and, hence, suppressing the formation of dislocations in the QD region. These results suggest an alternative approach to developing GaAs-based light sources in the telecommunication-wavelength range near 1.55μm.
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