Enhancement of Energy Storage in Epitaxial PbZrO3 Antiferroelectric Films Using Strain Engineering

Jun Ge,Denis Remiens,Xianlin Dong,Ying Chen,Jean Costecalde,Feng Gao,Fei Cao,Genshui Wang
DOI: https://doi.org/10.1063/1.4896156
IF: 4
2014-01-01
Applied Physics Letters
Abstract:We demonstrate an approach to enhance the energy storage density W of antiferroelectric film through simple altering a crystallographic orientation of the substrate. We reveal that the antiferroelectric phase stability of PbZrO3 can be enhanced for the (110) or (111) SrTiO3 substrate orientation, thus suppresses the antiferroelectric-ferroelectric phase transition to higher electric field with ∼120 kV/cm increment. In addition, the polarization values of these films are also favorably increased hence increases W by 5.3 J/cm3 at 700 kV/cm. The observed enhancement is found to originate from a high sensitivity of phase transition to mechanical confinements due to the volume expansion at the transition.
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