GaN Substrate and GaN Homo-Epitaxy for LEDs: Progress and Challenges

Wu Jie-Jun,Wang Kun,Yu Tong-Jun,Zhang Guo-Yi
DOI: https://doi.org/10.1088/1674-1056/24/6/068106
2015-01-01
Chinese Physics B
Abstract:After a brief review on the progresses in GaN substrates by ammonothermal method and Na-flux method and hydride vapor phase epitaxy(HVPE) technology,our research results of growing GaN thick layer by a gas flow-modulated HVPE,removing the GaN layer through an efficient self-separation process from sapphire substrate,and modifying the uniformity of multiple wafer growth are presented.The effects of surface morphology and defect behaviors on the GaN homo-epitaxial growth on free standing substrate are also discussed,and followed by the advances of LEDs on GaN substrates and prospects of their applications in solid state lighting.
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