Abstract:Simple and efficient nanofabrication technology with low cost and high flexibility is indispensable for fundamental nanoscale research and prototyping. Lithography in the near field using the surface plasmon polariton (i.e., plasmonic lithography) provides a promising solution. The system with high stiffness passive nanogap control strategy on a high-speed rotating substrate is one of the most attractive high-throughput methods. However, a smaller and steadier plasmonic nanogap, new scheme of plasmonic lens, and parallel processing should be explored to achieve a new generation high resolution and reliable efficient nanofabrication. Herein, a parallel plasmonic direct-writing nanolithography system is established in which a novel plasmonic flying head is systematically designed to achieve around 15 nm minimum flying-height with high parallelism at the rotating speed of 8–18 m·s−1. A multi-stage metasurface-based polarization insensitive plasmonic lens is proposed to couple more power and realize a more confined spot compared with conventional plasmonic lenses. Parallel lithography of the nanostructures with the smallest (around 26 nm) linewidth is obtained with the prototyping system. The proposed system holds great potential for high-freedom nanofabrication with low cost, such as planar optical elements and nano-electromechanical systems.

High Resolution Photolithography with Sub-Wavelength Grating

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Research of Subwavelength Grating Based on Multilayer Films Structure

Photolithography Using Lateral Surface of Nanofibers

Light and Matter Co-Confined Multi-Photon Lithography

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Super-resolution Photolithography Using Dielectric Photonic Crystal

Numerical Simulation of Nanolithography with the Subwavelength Metallic Grating Waveguide Structure

Deep Sub-Wavelength Photolithography Using Metal-Dielectric Multilayer

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Plasmonic Direct-Writing Lithography Via High Numerical Aperture Objectives.

Research of Photolithography Technology Based on Surface Plasmon

Simulation of Enhanced Lithography Resolution by the Effect of High Transmission Based on Surface Plasmon Polaritons

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Subwavelength Patterning Based On A Surface Plasmon Resonant Cavity

Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity.

Surface-plasmon-polaritons-assisted nanolithography with dual-wavelength illumination for high exposure depth.

Plasmonic Lithography: from Superlens to Hyperlens and Recent Metamaterial Development

Enlarging Focal Depth Using Epsilon-Near-zero Metamaterial for Plasmonic Lithography.

Maskless Plasmonic Lithography at 22 Nm Resolution.

A Large-Area Photolithography Technique Based on Surface Plasmons Leakage Modes