Interface Modulation and Resistive Switching Evolution in Pt/NiO X /al2o3/n+–si Structure

Haifa Zhai,Xiaojie Liu,Yanqiang Cao,Jizhou Kong,Xu Qian,Zhengyi Cao,Aidong Li,Yidong Xia,Di Wu
DOI: https://doi.org/10.1007/s00339-014-8889-y
2014-01-01
Abstract:The resistive switching evolution of NiO x /Al2O3 in Pt/NiO x /Al2O3/n+–Si structure was investigated with postannealing time. When increasing the postannealing time, larger voltage/current is needed to turn on/turn off the structure, respectively. Large memory resistance window can be obtained by the interface modulation of NiO x /Al2O3. For the fresh structure, the low resistance state (LRS) obeys Ohmic conduction mechanism and the high resistance state (HRS) fits Poole–Frenkel-like behavior. With the postannealing time increase, the reaction between NiO x and Al2O3 occurs. Finally, the Pt/Ni–Al–O/n+–Si structure forms. Schottky emission mechanism has dominated in the HRS, while the LRS shows Poole–Frenkel-like behavior.
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