Abstract:Nd0.7Sr0.3MnO3 films of various thicknesses were grown on (LaAlO3)(0.3)(Sr2AlTaO6)(0.7)(001) substrates by the pulsed-laser-deposition method, and their structure, metal-insulator (ferromagnetic-paramagnetic) transition temperature T-P (T-C) were examined by x-ray diffraction, resistivity and magnetization measurements. To clarify the effects of in situ deposition oxygen pressure on the thickness dependence of T-P (T-C), the films were grown at an oxygen pressure of 21 Pa and 35 Pa, respectively. X-ray reciprocal space mapping on the films showed that they were all grown coherently on the substrates. For films grown at low oxygen pressure the transition temperature decreases more rapidly with the reduction of film thickness, while for those deposited at high oxygen pressure, with the film thickness decreasing a strain-induced decrease in T-P (T-C) was observed. Our results indicate that to get higher T-P (T-C) especially for the ultra-thin films a higher deposition oxygen pressure is indispensable, and this is crucial for understanding the thickness effect in epitaxial manganite films. The ex-situ annealing effects on the thin and thick films were also discussed in terms of their different microstructure.

Influence of the Oxygen Pressure on the Preferred Orientation and Optical Properties of the Pulsed-Laser Deposited Mn1.56Co0.96Ni0.48O4±δ Thin Films

Effects of Preferred Orientation on Electrical Properties of Mn1.56Co0.96Ni0.48O4±δ Spinel Films

Impact of Deposition Oxygen Pressure on the Thickness Effects in Epitaxial Nd0.7Sr0.3MnO3thin Films

Magnetoresistance in Oxygen Deficient La0.75Sr0.25MnO3−δ Thin Films Prepared by Pulsed Laser Deposition

Thickness dependence of microstructures and optical properties of Mn1.56Co0.96Ni0.48O4 thin films

Effect of Ar/O2 Ratio on Structure and Cationic Distribution of Mn1.56Co0.96Ni0.48O4±δ Spinel Films

The effect of oxygen partial pressure on the electron-magnetic properties of La0.67Sr0.33MnO3-δ epitaxial films with different orientations

Effect of Oxygen Partial Pressure and Temperature on NTC Characteristics of Mn1.56Co0.96Ni0.48O4 Thin Films Grown on SrTiO3 (1 0 0) by Laser MBE

Influence Of Oxygen Pressure On Structures And Electrical Properties Of Lead-Free (K0.44na0.52li0.04)(Nb0.86ta0.10sb0.04)O3 Thin Films Deposited By Pulsed Laser Deposition

In situ oxygen control and high thermal stability of epitaxial (La1-xNdx)0.7Sr0.3MnO3 films fabricated by pulsed laser deposition

Effect of Oxygen Content on the Structural, Transport, and Magnetic Properties of La1−δMn1−δO3 Thin Films

Oxygen Pressure Dependence Of Structure And Electrical Properties Of Pulsed Laser Deposited Ba(Fe(1/2)Nb(1/2))O(3) Thin Films

Effects of substrate temperature and oxygen pressure on the magnetic properties and structures of CoFe2O4 thin films prepared by pulsed-laser deposition

Structure, optical, and electrical properties of (Mn1.56Co0.96Ni0.48O4)1−x(LaMn0.6Al0.4O3)x composite thin films

The Effects of Oxygen Pressure on the Structural, Magnetic, and Ferroelectric Properties of 0.55bife0.95ga0.03mn0.02o3–0.45batio3 Thin Films

The Large Magnetoresistance Property of La0.5Sr0.5CoO3−x Thin Films Prepared by Pulsed Laser Deposition

Oxygen pressure dependent electroresistance in La 0.9 Sr 0.1 MnO 3 thin films grown by laser molecular beam epitaxy

Influence of Oxygen Background Pressure on the Structure and Properties of Epitaxial SrTiO3/La0.35Nd0.35Sr0.3MnO3 Heterostructures Grown by Pulsed Laser Deposition

Preparation of La 2 NiMnO 6 Thin Films on Pt/TiO 2 /sio 2 /si Substrates by Pulsed Laser Deposition

Oxygen In-Diffusion at Room Temperature in Epitaxial La0.7Ca0.3MnO3−δthin Films

Structural, Optical, And Electrical Properties Of (Mn1.56co0.96ni0.48o4)(1-X)(Lamno3)(X) Composite Thin Films