Abstract:A three-component Fibonacci (3CF) Ta/Al multilayer has been reinvestigated by specular and diffuse x-ray reflectivity and x-ray photoelectron spectroscopy (XPS) after 41 months of storage at room temperature. The specular reflectivity shows drastically suppressed diffraction peaks, whose positions and intensities are explained by severe interdiffusion of the Ta/Al bilayers building the 3CF sequence. Nonspecular reflectivity scans still indicate a high degree of interfacial roughness correlation in the growth direction that is attributed to the long spatial Fourier components of the interface profiles, which are substantially less affected by interdiffusion. The angle-resolved XPS spectra show that the Ta capping layer is completely oxidized and interdiffused by Al, whereas below the oxide layer Ta and Al coexist in metallic form in the same film. Both x-ray reflectivity and XPS yield an oxide layer of ∼30 Å thickness. Despite the severe structural disintegration, the multilayer diffraction spectrum can still be indexed by means of the projection theory for quasiperiodic sequences, which points to a remarkable stability of quasiperiodic properties against significant disorder. We conclude that Ta/Al bilayers are apparently unsuitable for multilayer applications due to the lack of thermal stability even at room temperature, with grain boundary diffusion pointed out as a possible disintegration mechanism. The design of improved 3CF Ta/Al multilayers is discussed with regard to applications in x-ray optics.

Study On Quasi-Periodic Ta/Al Multilayer Films By X-Ray-Diffraction

An Electron-Diffraction and Microscopy Investigation of Quasi-Periodic Ta-Al Superlattices

Diffraction Behaviour of Three-Component Fibonacci Ta/Al Multilayer Films

Structural Characterization Of Ta/Al Multilayer Films

Quasiperiodic metallic multilayers

Long-term Stability of a Quasiperiodic Ta/Al Multilayer: Disintegration at Room Temperature Analyzed by Grazing Angle X-Ray Scattering and Photoelectron Spectroscopy

Structural Characterization Of 3-Component Fibonacci Ta/Al Multilayer Films

Microstructural observations of Ta/Al superlattices by TEM

Brillouin Scattering from Metallic Ta/Al Fibonacci Multilayers

Observations of an unusual modulated structure with double-periodicity in Fe–Al multilayers

MICROSTRUCTURE AND ELECTRICAL PROPERTIES OF Al/TaNx MULTILAYERS

X-ray Diffraction of Cu/Ti Fibonacci Superlattices

Effective Elastic Constants and Phonon Spectrum in Metallic Ta/Al Quasiperiodic Superlattices

Raman scattering by longitudinal acoustic phonons in a three-component Ta/Al Fibonacci superlattice

Atomic assembly of Cu/Ta multilayers: Surface roughness, grain structure, misfit dislocations, and amorphization

X-ray Diffraction Studies of Trilayer Oscillations in the Preferred Thickness of in Films on Si(111)

X-ray Diffraction Pattern of Quasiperiodic (fibonacci) Nb-Cu Superlattices

alpha-Ta Films on c-plane Sapphire with Enhanced Microstructure

Magnetic properties of Fe/Al multilayers with double-periodicity modulated structure

Microstructure Stabilization and Morphology Evolution in Al/Ta Nano-multilayers

Influence of period deviation on soft x-ray diffraction of multilayers