P -Doped 1.3μm InAs∕GaAs Quantum-Dot Laser with a Low Threshold Current Density and High Differential Efficiency

H. Y. Liu,S. L. Liew,T. Badcock,D. J. Mowbray,M. S. Skolnick,S. K. Ray,T. L. Choi,K. M. Groom,B. Stevens,F. Hasbullah,C. Y. Jin,M. Hopkinson,R. A. Hogg
DOI: https://doi.org/10.1063/1.2336998
IF: 4
2006-01-01
Applied Physics Letters
Abstract:A modification of the thickness of the low-growth-temperature component of the GaAs spacer layers in multilayer 1.3μm InAs∕GaAs quantum-dot (QD) lasers has been used to significantly improve device performance. For a p-doped seven-layer device, a reduction in the thickness of this component from 15to2nm results in a reduced reverse bias leakage current and an increase in the intensity of the spontaneous emission. In addition, a significant reduction of the threshold current density and an increase of the external differential efficiency at room temperature are obtained. These improvements indicate a reduced defect density, most probably a combination of the selective elimination of a very low density of dislocated dots and a smaller number of defects in the thinner low-growth-temperature component of the GaAs spacer layer.
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