Model Of Collisional Sheath Evolution In Plasma Source Ion-Implantation

dezhen wang,tengcai ma,xinlu deng
DOI: https://doi.org/10.1063/1.354612
IF: 2.877
1993-01-01
Journal of Applied Physics
Abstract:A model is developed to study the temporal evolution of the sheath during a pulse of high negative voltage applied to a target immersed in a plasma, such as that present in plasma source ion implantation. This model covers the whole range from collision free to collision dominated sheaths. The sheath expansion velocity and the position of the sheath edge as a function of time in planar geometries for various pressures are obtained.
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