Charging Effects on Temporal and Spatial Evolution of the Dusty Plasma Sheath in Plasma Source Ion Implantation

DY Liu,DZ Wang,XG Wang,JY Liu
DOI: https://doi.org/10.1063/1.1349873
IF: 2.2
2001-01-01
Physics of Plasmas
Abstract:The temporal and spatial evolution of a dusty plasma sheath in plasma source ion implantation has been investigated with a fluid theory and a self-consistent dust charging model. A negative potential pulse is introduced to form the plasma sheath. The effect of the dust charging process becomes significant when the charging time is longer than either the pulse period or the ion response time (measured by the inverse of the ion plasma frequency). Numerical results indicate that the sheath expands faster than dust-free sheaths. It is also shown that, for small dust particles, the motion of dust particles is very remarkable and the charging effect can be negligible, and for large dust particles, the charging effect of dust particles becomes more evident while they are almost kept stationary during the whole negative potential pulse.
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