Laser Annealing of Laser Assisted Molecular Beam Deposited Zno Thin Films with Application to Metal-Semiconductor-Metal Photodetectors

Meiya Li,Wayne Anderson,Nehal Chokshi,Robert L. DeLeon,Gary Tompa
DOI: https://doi.org/10.1063/1.2344811
IF: 2.877
2006-01-01
Journal of Applied Physics
Abstract:We report on the effect of postdeposition laser annealing of undoped zinc oxide (ZnO) thin films grown by laser assisted molecular beam deposition. Hall-effect measurements show that some undoped ZnO films change from n type with mobility values in the range of 200cm2V−1s−1 to p-type material with mobility value of 73cm2V−1s−1, after laser annealing. The photoconductive behavior was clearly seen on the laser-annealed samples, with values of 0.28mΩ−1. The structural and optical properties of the films were improved with laser annealing as shown by scanning electron microscopy, x-ray photoelectron spectroscopy analysis, and photoluminescence measurement. All of the nonlaser and laser annealed samples showed near-band emission at ∼3.3eV. Metal-semiconductor-metal photodetectors were fabricated from the films.
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