Effect of Etching on the Laser-Induced Damage Properties of Artificial Defects under 1064-Nm Laser Irradiation

Menglei Lu,Bin Ma,Guangda Zhan,Hongfei Jiao,Xinbin Cheng
DOI: https://doi.org/10.1117/1.oe.53.12.122505
IF: 1.3
2014-01-01
Optical Engineering
Abstract:The cracks and scratches inevitably generated by previous grinding and polishing significantly lower the ability of laser resistance of optical substrates. In this study, the artificial indentations, scratches, and structural defects imbedded with metal nanoparticles are fabricated. The laser-induced damage characteristics of such defects in different types and sizes are investigated qualitatively and quantitatively under 1064-nm laser irradiation. Moreover, the etching effect on improving the laser-induced damage threshold (LIDT) of artificial defects under different etching conditions is analyzed. LIDT is then evaluated according to the etching depth and the morphologies of artificial defects. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)
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