Controllable End Shape Modification of Zno Nano-Arrays/Rods by A Simple Wet Chemical Etching Technique

Jingchang Sun,Ting Zhao,Zhangwei Ma,Ming Li,Cheng Chang,Hongwei Liang,Jiming Bian,Chengren Li
DOI: https://doi.org/10.1088/0022-3727/48/36/365303
2015-01-01
Abstract:The well-aligned ZnO nano-arrays/rods synthesized by a chemical bath deposition method on a highly conductive Si substrate were chemically etched in an ammonia chloride aqueous solution. An obvious end shape modification of ZnO nano-arrays/rods was realized in this report. The hexagonal frustum end of ZnO nano-arrays/rods changed into a pyramid and the diameter of ZnO nano-arrays/rods decreased gradually with the increasing etching time. The evolution mechanism of the wet etching process was discussed based on a proposed evolution model. Photoluminescence measurements indicated that the near band edge emissions of ZnO nano-arrays/rods increased greatly after wet etching. The controllable end shape modification of ZnO nano-arrays/rods on a highly conductive Si substrate by this simple wet etching technique will further explore the application of ZnO in field emission devices and 1D based nano-devices with various end shapes.
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