Abstract:Using custom made experimental apparatus, the art of electrochemical etching was systematically studied for fabricating micro/nano tungsten probes with controllable tip profiles of exponential, conical, multidiameter, and calabashlike shapes. The characteristic parameters of probe including length, aspect ratio, and tip apex radius could also be well defined. By combining of static and dynamic etching, the conical-shape probe with length up to several millimeters, controllable tip apex radius, and cone angle could be fabricated. In addition, by continuously lifting the tungsten wire up during the electrochemical etching with different speeds and distances, the multidiameter shape probe could be fabricated. Finally by controlling the anodic flow, the multiple “neck-in” could be realized creating a calabashlike probe. The aspect ratio of probes depends on (i) the effective contact time between the surrounding electrolyte and the wire, (ii) the neck-in position of immersed tungsten wire. Under the optimized etching parameters, tungsten probes with a controllable aspect ratio from 20:1 to 450:1, apex radius less than 20 nm, and cone angle smaller than 3° could be achieved. The technique is well suited for the tungsten probe fabrication with a stabilized stylus contour, ultra-sharp apex radius, and high production reproducibility. The art for preparing microprobes will facilitate the application of such microprobes in diverse fields such as dip-pen nanolithography, scanning probe microscopy, micromachining, and biological cellular studies.

Fabrication of high-aspect-ratio platinum probes by two-step electrochemical etching

Rapid Fabrication of High-Aspect-Ratio Platinum Microprobes by Electrochemical Discharge Etching

Electrochemical Preparation of STM Probes for High Aspect Ratio Nanometrology

The Art of Electrochemical Etching for Preparing Tungsten Probes with Controllable Tip Profile and Characteristic Parameters

A reproducible electropolishing technique to customize tungsten SPM probe: From mathematical modeling to realization

Polished nanopipets: new probes for high-resolution scanning electrochemical microscopy.

Fabrication of Long and Smooth Tungsten Probes for Nano-manipulation

Systematic Study of Electropolishing Technique for Improving the Quality and Production Reproducibility of Tungsten STM Probe

One-step Fabrication of Sharp Platinum/Iridium Tips via Amplitude-Modulated Alternating-Current Electropolishing

Fabrication of the Tip of GaAs Microwave Probe by Wet Etching

Fabrication of Very-High-Aspect-Ratio Micro Metal Posts and Gratings by Photoelectrochemical Etching and Electroplating

Fabrication of Tungsten nanoprobes by Electrochemical etching: Role of cathode geometry and their use as electrical probe

High‐Aspect‐Ratio Grating Microfabrication by Platinum‐Assisted Chemical Etching and Gold Electroplating

Fabrication of high-aspect-ratio metallic microstructures by microelectroforming using silver-coated polydimethylsiloxane molds with controllable wettability

Fabrication of High‐quality SNOM Probes by Pre‐treating the Fibres Before Chemical Etching

Fabrication and Characterization of Probes for Combined SPM Techniques Based on PECVD

On-Demand 3D Printing of Nanowire Probes for High-Aspect-Ratio Atomic Force Microscopy Imaging

Efficient Fabrication of a High-Aspect-ratio AFM Tip by One-Step Exposure of a Long Focal Depth Holographic Femtosecond Axilens Beam

Systematic electrochemical etching of various metal tips for tunneling spectroscopy and scanning probe microscopy

Fabrication and Characterization of Plasmonic Nanorods with High Aspect Ratios

A high-yield fabrication process for silicon neural probes