Abstract:Amorphous boron carbide (B4C) thin films are by far the most popular form for the neutron converting layers in the 10B-based neutron detectors, which are a rising trend in detector technologies in response to the increasing scarcity and price of 3He, the standard material for neutron detection. The microstructure of the B4C films is closely related to the important properties, e.g. density and adhesion, for the converting layers, which eventually affect the detection efficiency and the long-term stability of the detectors. To study the influence from substrates of different roughness and materials, the B4C films were deposited on polished Si substrates with Al, Ti, and Cu buffer layers and unpolished Si, Al, Ti, and Cu substrates by direct current magnetron sputtering at a substrate temperature of 623 K. The tapered columnar grains and nodular defects, generally observed in SEM images, indicated a strong shadowing effect where voids were introduced around the grains. The change in the grain size did not show a direct dependence to the substrate roughness, acquired from the surface profile, nor to the mass density of the films, obtained from reflectivity patterns. However, films with non-uniform size of columnar grains were deposited on substrates with high skewness, leading to a drop of mass density from ~95 % down to ~70 % of tabulated bulk density. On the other hand, similar microstructures and mass density were obtained from the films deposited on Al, Ti, and Cu of different roughness and good adhesion were observed from cross-cut adhesion tests, showing the reliability of sputtering deposited B4C films on common structural materials in neutron detectors.

Microstructure, Hardness and Toughness of Boron Carbide Thin Films Deposited by Pulse Dc Magnetron Sputtering

Chemical Structure and Micro-Mechanical Properties of Ultra-Thin Films of Boron Carbide Prepared by Pulsed-Laser Deposition

Synthesis of boron carbide films by ion beam sputtering

Superhard Boron-Rich Boron Carbide with Controlled Degree of Crystallinity

Influence of Length-Scale on Stabilization of Boron Carbide in Al-based Metal Matrix Composites During Plasma Activated Sintering

Synthesis and characterization of boron carbon nitride films by radio frequency magnetron sputtering

Influences of Working Power on Properties for Boron Films Deposited by RF Magnetron Sputtering

A Study of Nano-Mechanical Properties and Nano-Scratch Behavior of Boron Carbonitride Films.

Microstructure and Mechanical Properties of B4C - C Ceramic

Fabrication and characterization of hot-pressed B-rich boron carbide

Influence of Sintering Process Conditions on Microstructural and Mechanical Properties of Boron Carbide Ceramics Synthesized by Spark Plasma Sintering

Effect of substrate roughness and material selection on the microstructure of sputtering deposited boron carbide thin films

Boron Doped Bcc-W Films: Achieving Excellent Mechanical Properties and Tribological Performance by Regulating Substrate Bias Voltage

Microstructure and Deposition Mechanism of Cvd Amorphous Boron Carbide Coatings Deposited on Sic Substrates at Low Temperature

Effect of Spark Plasma Sintering on Microstructure and Friction Characteristics of Boron Carbide

Microstructural Study of Oxidation of Carbon-Rich Amorphous Boron Carbide Coating

The Influence of Residual Gas on Boron Carbide Thin Films Prepared by Magnetron Sputtering

Preparation of Boron Carbon Nitride Thin Films by Radio Frequency Magnetron Sputtering

Exceptional Strength-Toughness-hardness Integrated B4C Ceramics with Synergistic Reinforcement of Nano-Bn and In-Situ Ceramic Phases

Influence of CrB2 target current on the microstructure, mechanical and tribological properties of Cr–B–C–N coatings in water

Study of Nanomechanical Properties and Nanotribological Behavior of BCN Films Deposited by Magnetron Sputtering