Bi2sr2cacu2o8+Delta Intrinsic Josephson Junctions Fabricated By A Simple Technique Without Photolithography
Y. J. Feng,W. L. Shan,M. Jin,J. Zhou,G. D. Zhou,Z. M. Ji,L. Kang,W. W. Xu,S. Z. Yang,P. H. Wu,Y. H. Zhang
DOI: https://doi.org/10.1109/77.784032
IF: 1.9489
1999-01-01
IEEE Transactions on Applied Superconductivity
Abstract:Due to the roughness in the surface of the crystal sample, it is hard to use photolithography in the patterning process of the Bi2Sr2CaCu2O8+delta intrinsic Josephson junction. In this gaper, we report a simple technique for fabricating the Bi2Sr2CaCu2O8+delta intrinsic Josephson junctions. In the patterning process, metal masks are used instead of photolithography and argon ion milling is applied to form a small mesa on the Bi2Sr2CaCu2O8+delta crystal surface. Real four-probe transport measurements are made on the Bi2STZCaCU208+6 intrinsic junctions and typical current-voltage characteristics with multi-branch structure have been observed, from which the superconducting gap parameter can be extracted, Additionally, from the strong hysteresis in the I-V characteristics, the capacitance C-J of the unit intrinsic Josephson junction can be estimated, which is in good agreement with that evaluated from the geometric parameters of the unit junction between the two copper oxide layers.