Unique Characteristics of Vertical Carbon Nanotube Field-effect Transistors on Silicon

Jingqi Li,Weisheng Yue,Zaibing Guo,Yang,Xianbin Wang,Ahad A. Syed,Yafei Zhang
DOI: https://doi.org/10.1007/bf03353793
IF: 26.6
2014-01-01
Nano-Micro Letters
Abstract:A vertical carbon nanotube field-effect transistor(CNTFET) based on silicon(Si) substrate has been proposed and simulated using a semi-classical theory. A single-walled carbon nanotube(SWNT) and an n-type Si nanowire in series construct the channel of the transistor. The CNTFET presents ambipolar characteristics at positive drain voltage(Vd) and n-type characteristics at negative Vd. The current is significantly influenced by the doping level of n-Si and the SWNT band gap. The n-branch current of the ambipolar characteristics increases with increasing doping level of the n-Si while the p-branch current decreases. The SWNT band gap has the same influence on the p-branch current at a positive Vd and n-type characteristics at negative Vd. The lower the SWNT band gap, the higher the current. However, it has no impact on the n-branch current in the ambipolar characteristics. Thick oxide is found to significantly degrade the current and the subthreshold slope of the CNTFETs.
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