Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

Hydrothermal Fabrication of Zno Nanorod-Based Grating Patterns with Arrays of Optical Fiber Cores As Templates

Construction of 3d Arrays of Cylindrically Hierarchical Structures with Zno Nanorods Hydrothermally Synthesized on Optical Fiber Cores

Hydrothermal Synthesis of Well-Aligned ZnO Nanorod Arrays on Silicon

Modulating the Morphology of Zno Nanorod Arrays on Siox- Mask-Patterned Gan Template

Fabrication and Optical Properties of Highly Ordered ZnO Nanodot Arrays

Fabrication of High-Density Moiré Gratings

Large-area zinc oxide nanorod arrays templated by nanoimprint lithography: control of morphologies and optical properties

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Fabrication of surface-patterned ZnO thin films using sol-gel methods and nanoimprint lithography

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography

Fabrication of Spherically Hierarchical Structures with ZnO Nanowires Synthesized on Au and SiO2 Microspheres

All-silicon Nanorod-Based Dammann Gratings.

Fabrication of Slanted Gratings with High Refractive Index Starting from Master Nanoimprint Mold.

Patterning Nanoscale Crossed Grating with High Uniformity by Using Two-Axis Lloyd's Mirrors Based Interference Lithography.

Fabrication of High Aspect Ratio Silicon Gratings by Interference Lithography and Potassium Hydroxide Anisotropic Etch Technique

Effects of the Geometries of Micro-Scale Substrates on the Surface Morphologies of ZnO Nanorod-Based Hierarchical Structures

Fabrication and characterization of highly ordered zirconia nanowire arrays by sol–gel template method

High-Resolution Nanosphere Lithography (nsl) to Fabricate Highly-Ordered Zno Nanorod Arrays

Controllable Heterogeneous Nucleation for Patterning High‐Quality Vertical and Horizontal ZnO Microstructures toward Photodetectors

Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

Micro cutting of V-shaped cylindrical grating template for roller nano-imprint