Introducing Ga 2 O 3 Thin Films As Novel Electron Blocking Layer to ZnO/ P -Gan Heterojunction LED

Yuanda Liu,Hongwei Liang,Xiaochuan Xia,Rensheng Shen,Yang Liu,Jiming Bian,Guotong Du
DOI: https://doi.org/10.1007/s00340-012-5219-y
2012-01-01
Abstract:N-ZnO/Ga2O3/p-GaN heterojunction light-emitting diode (LED) was fabricated by metal-organic chemical vapor deposition. Compared with the n-ZnO/p-GaN structure, the deep level visible emission at 525 nm was completely suppressed while UV emission at ~392 nm was significantly improved in ZnO/Ga2O3/p-GaN structure. The role of Ga2O3 in n-ZnO/Ga2O3/p-GaN heterojunction LED was discussed in detail.
What problem does this paper attempt to address?