Abstract:A laser‐based solution to produce highly‐controllable arrays of deep nanoholes at the surface of dielectric materials is reported. Dedicated shaping of a short‐pulse laser beam is exploited to process dense square arrays of holes with diameters down to 200 nm and depths in the range 3–20 μm. This opens perspectives for manufacturing integrated devices using this cost‐effective alternative nanofabrication method. Periodic nanohole arrangements constitute an important building block of advanced photonic devices. Aside from standard nanofabrication tools, a direct laser‐based approach is introduced here, that enables single‐step and point‐by‐point machining of arrays of holes with subwavelength diameters and depths reaching several micrometers at the surface of fused silica. The method relies on a simple optical arrangement including an axicon combined with an amplitude mask to shape the laser intensity in appropriately truncated micro‐Bessel beams of adjustable length. The suitability and limitations of the technique are investigated to fabricate arrays of cylindrical nanoholes with tunable depths. In particular, the challenge of avoiding crosstalk effects during the laser‐writing process of high‐density arrays is explored. The achievability of square arrays of nanoholes at the surface of fused silica, with diameters down to 200 nm and variable depths from 3 to 20 μm at a spatial density defined by a pitch of 1.5 μm is demonstrated. The performance level shows the potential of the direct‐laser‐processing method towards the realization of integrated devices, offering a highly flexible and cost‐effective alternative technique to current nanofabrication methods.

Deep-subwavelength Nanohole Arrays Embedded in Nanoripples Fabricated by Femtosecond Laser Irradiation

Fabrication of Nanostructures on Silicon Carbide Surface and Microgroove Sidewall Using 800-Nm Femtosecond Laser

Periodic nanohole array structure induced on a silicon surface by direct writing with a femtosecond laser

Femtosecond Laser Induced Ripples And Nanohole Arrays On Silicon

Uniform Nano-Ripples on the Sidewall of Silicon Carbide Micro-Hole Fabricated by Femtosecond Laser Irradiation and Acid Etching

Engraving Depth‐Controlled Nanohole Arrays on Fused Silica by Direct Short‐Pulse Laser Ablation

Compound Structures of Periodic Holes and Curved Ripples Fabricated by the Interference Between the Converging Surface Plasmon Polaritons and Femtosecond Laser

Formation Mechanisms of Uniform Arrays of Periodic Nanoparticles and Nanoripples on 6H-Sic Crystal Surface Induced by Femtosecond Laser Ablation

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Laser-induced self-organized periodic nano-hole/nano-ridge structures on the surface of silicon produced with a tightly focused femtosecond pulse laser beam

Nanolaser arrays based on individual waved CdS nanoribbons

Regular Uniform Large-Area Subwavelength Nanogratings Fabricated by the Interference of Two Femtosecond Laser Beams Via Cylindrical Lens

Colorizing Silicon Surface with Regular Nanohole Arrays Induced by Femtosecond Laser Pulses

Polarization-switchable Nanoripples Fabricated on a Silicon Surface by Femtosecond-Laser-assisted Nanopatterning.

Laser drilling sub-10 nm holes on an island-shaped indium thin film

Dual-scale Nanoripple/nanoparticle-Covered Microspikes on Silicon by Femtosecond Double Pulse Train Irradiation in Water

Deepening of nanograting structures on Si by a two-step laser spatial-selective amorphization strategy combined with chemical etching

Rapid Production Of Large-Area Deep Sub-Wavelength Hybrid Structures By Femtosecond Laser Light-Field Tailoring

Formation of Periodical Sub-Micron Sized Structures on Silicon by Interfered Nanosecond Laser Pulses

Silicon Microholes Array Fabricated by Femtosecond Laser Pulses Directly Writing Assisted with Further Electrochemical Etching

Optical nanofiber-based cavity induced by periodic air-nanohole arrays