Interface-induced Topological Insulator Transition in GaAs/Ge/GaAs Quantum Wells.

Dong Zhang,Wenkai Lou,Maosheng Miao,Shou-cheng Zhang,Kai Chang
DOI: https://doi.org/10.1103/physrevlett.111.156402
IF: 8.6
2013-01-01
Physical Review Letters
Abstract:We demonstrate theoretically that interface engineering can drive germanium, one of the most commonly used semiconductors, into a topological insulating phase. Utilizing giant electric fields generated by charge accumulation at GaAs/Ge/GaAs opposite semiconductor interfaces and band folding, the new design can reduce the sizable gap in Ge and induce large spin-orbit interaction, which leads to a topological insulator transition. Our work provides a new method to realize topological insulators in commonly used semiconductors and suggests a promising approach to integrate it in well-developed semiconductor electronic devices.
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