Polarization-driven Topological Insulator Transition in a GaN/InN/GaN Quantum Well.

C. G. Van de Walle
DOI: https://doi.org/10.1103/physrevlett.109.186803
IF: 8.6
2012-01-01
Physical Review Letters
Abstract:Topological insulator (TI) states have been demonstrated in materials with a narrow gap and large spin-orbit interactions (SOI). Here we demonstrate that nanoscale engineering can also give rise to a TI state, even in conventional semiconductors with a sizable gap and small SOI. Based on advanced first-principles calculations combined with an effective low-energy k · p Hamiltonian, we show that the intrinsic polarization of materials can be utilized to simultaneously reduce the energy gap and enhance the SOI, driving the system to a TI state. The proposed system consists of ultrathin InN layers embedded into GaN, a layer structure that is experimentally achievable.
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