Enhancement of Ferroelectric Polarization Stability by Interface Engineering.

H. Lu,X. Liu,J. D. Burton,C. -W. Bark,Y. Wang,Y. Zhang,D. J. Kim,A. Stamm,P. Lukashev,D. A. Felker,C. M. Folkman,P. Gao,M. S. Rzchowski,X. Q. Pan,C. -B. Eom,E. Y. Tsymbal,A. Gruverman
DOI: https://doi.org/10.1002/adma.201104398
IF: 29.4
2012-01-01
Advanced Materials
Abstract:By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.
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