High Quantum Efficiency Gan-Based P-I-N Ultraviolet Photodetectors Prepared on Patterned Sapphire Substrates

Guosheng Wang,Hai Lu,Dunjun Chen,Fangfang Ren,Rong Zhang,Youdou Zheng
DOI: https://doi.org/10.1109/lpt.2013.2248056
IF: 2.6
2013-01-01
IEEE Photonics Technology Letters
Abstract:In this letter, GaN-based p-i-n ultraviolet (UV) photodetectors (PDs) are fabricated on patterned sapphire substrate (PSS) for the first time. Based on cathodoluminescence mapping and x-ray diffraction measurement, the as-grown structure on PSS has considerably lower defect density than that of a similar structure grown on standard sapphire substrate (SSS). The PD on PSS exhibits a low dark current density of ${\sim}{\rm 5.1}~{\rm nA}/{\rm cm}^{2}$ under ${-}{\rm 5}~{\rm V}$, a high UV/visible rejection ratio of more than $10^{{4}}$, and a zero-bias peak responsivity of ${\sim}{\rm 0.19}~{\rm A}/{\rm W}$ at 360 nm, which corresponds to a maximum quantum efficiency of 65%. In the photo-sensitive wavelength region between 250 and 365 nm, the quantum efficiency of the PD on PSS is, on average, over 30% higher than that of the control device fabricated on SSS.
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