A 60-Ghz Efficiency-Enhanced On-Chip Dipole Antenna Using Helium-3 Ion Implantation Process

Rui Wu,Wei Deng,Shinji Sato,Takuichi Hirano,Ning Li,Takeshi Inoue,Hitoshi Sakane,Kenichi Okada,Akira Matsuzawa
DOI: https://doi.org/10.1109/eumc.2014.6986381
2014-01-01
Abstract:A 60-GHz CMOS on-chip dipole antenna with efficiency-enhancement technique is presented. A helium-3 ion irradiation process is used to reduce the substrate losses of the on-chip antenna. The radiation efficiency of the antenna is doubled using the ion implantation technique. The antenna is fabricated in a 65-nm CMOS technology with a core area of 0.48 mm2. The on-chip antenna achieves a peak gain of -4.1 dBi at 60GHz and a gain fluctuation of around ±1dB from 57 GHz to 67GHz.
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