Investigating Ultra-thin Ag and Au Layers Using Spectrophotometry and AFM Imaging

Riley Shurvinton,Valentin Allard,Aude Lereu,Antonin Moreau,Fabien Lemarchand,Julien Lumeau

DOI: https://doi.org/10.1051/jeos/2024005

2024-02-12

Abstract:A spectrophotometric method is demonstrated for refractive index and thickness determination of thin and ultrathin metallic films. The method involves a three-layer stack where the metallic layer of interest is deposited on an opaque Si wafer coated with SiO2. This stack creates oscillations in the reflectance spectrum, which are highly sensitive to the index of the metallic film, allowing precise determination of the index of layers down to 1nm. Experimental index values are given for Ag and Au over the wavelength range of 370-835nm. These results are correlated with AFM images of the films, which reveal dramatic changes in structure for layers of different thickness.

optics

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to accurately determine the refractive index and thickness of ultrathin metal films, especially silver (Ag) and gold (Au). Since these films have important applications in optical coating design and control, accurate measurement of their refractive index is crucial for optimizing these applications. However, the properties of ultrathin metal films change significantly with the change of thickness, which makes the determination of their refractive index very challenging. Traditional measurement methods, such as ellipsometer technology, have limitations when dealing with films with a thickness less than about 15 nanometers.

For this reason, the author proposes a spectroscopic method based on a three - layer - stacked structure. This structure is created by depositing a silicon dioxide layer and a target metal layer on an opaque silicon wafer. This method utilizes the interference fringes in the reflection spectrum, which are highly sensitive to the refractive index of the metal layer, so that the refractive index of a metal layer as thin as 1 nanometer or even thinner can be accurately determined. This method not only improves the measurement accuracy, but also is applicable to a variety of materials and can reveal the changes in the film nanostructure at different thicknesses.

Specifically, the paper experimentally determined the refractive index values of silver and gold in the wavelength range of 370 - 835 nanometers and compared them with atomic force microscope (AFM) images to provide in - depth insights into the structural evolution of these films with the change of thickness. These results not only verify the effectiveness and reliability of the proposed measurement method, but also make it possible to further study the ultrathin layers of other materials.