Ti/TiN Multilayer Thin Films Deposited by Pulse Biased Arc Ion Plating

Yanhui Zhao,Guoqiang Lin,Jinquan Xiao,Hao Du,Chuang Dong,Lijun Gao
DOI: https://doi.org/10.1016/j.apsusc.2010.10.042
IF: 6.7
2010-01-01
Applied Surface Science
Abstract:In this work, the effect of modulation period (A) on Ti/TiN multilayer films deposited on high-speed-steel (HSS) substrates using pulse biased arc ion plating is reported. The crystallography structures and crosssectional morphology of Ti/TiN multilayer films were characterized by X-ray diffraction analysis (XRD) and scanning electron microscopy (SEM), respectively. Their mechanical properties were determined via nanoindentation measurements, while the film/substrate adhesion via the scratch test. It was found that the highest hardness value reached 43 GPa for the modulation period of 54 nm, while the film/substrate adhesion also reached the highest value of 83 N. Furthermore, the hardness enhancement mechanism in the multilayer films is discussed. (C) 2010 Elsevier B.V. All rights reserved.
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