The Mechanism of Super Hardness of Nanocrystallite TiN Films Deposited by Pulsed D.c. Bias Multi-Arc Ion Plating

XU Jianhua,WANG Xin,MA Shengli,LIU Yang,XU Kewei
DOI: https://doi.org/10.3321/j.issn:1005-3093.2008.02.018
2008-01-01
Abstract:Nanocrystallite TiN films were deposited on W18Cr4V high-speed steel (HSS) substrates using pulsed d.c.bias multi-arc ion plating,the mechanism of the super hardness of the nanocrystallite TiN films was investigated.The results show that the film thickness is 2-3μm,the crystalline size is about 13-16 nm,and especially the nanocrystallite TiN films hold super hardness of 36-43 GPa.The measured hardness of annealed nanocrystallite TiN films at elevated temperature confirm that the super hardness of the nanocrystallite TiN films are produced not only by the ion bombardment induced residual stress within the film,but also due to the decrease of crystalline size,dense microstructure and the film deposition onto the strongly preferential orientation with the (111) plane,which is the atomic closed arrangement plane of f.c.c.TiN.
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