High-power Density SiC MESFETs with Multi-Recess Gate

X. C. Deng,L. Li,B. Zhang,J. H. Mo,Y. Wang,Z. J. Li
DOI: https://doi.org/10.1049/el.2011.0048
2011-01-01
Electronics Letters
Abstract:Silicon carbide (SiC) MESFETs were fabricated by using a standard SiC MESFET structure with the application of the multi-recessed gate in the process. The multi-recessed gate structure is effective in increasing the output power density, due to higher breakdown voltage. A 250 mm gate periphery SiC MESFET biased at a drain voltage of 65 V demonstrated a pulsed wave saturated output power of 2.24 W with a linear gain of 8 dB at 2 GHz. RF power output greater than 8.9 W/mm was achieved, showing the potential of these devices for high-power operation.
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