Patterning Graphene with Zigzag Edges by Self-Aligned Anisotropic Etching

Zhiwen Shi,Rong Yang,Lianchang Zhang,Yi Wang,Donghua Liu,Dongxia Shi,Enge Wang,Guangyu Zhang
DOI: https://doi.org/10.1002/adma.201100633
IF: 29.4
2011-01-01
Advanced Materials
Abstract:A top-down approach for controlled tailoring of graphene nanostructures with zigzag edges is presented. It consists of two key steps: artificial defect patterning and hydrogen-plasma etching. With this approach, various graphene nanostructures with sub-10 nm features and identical zigzag edges are reliably achieved. This approach shows great promise for making future graphene devices or circuits.
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